nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
AIXTRON GmbH — The CVD engineering company
|
O'Connell, Sarah |
|
1996 |
27 |
4-5 |
p. i-ii nvt p. |
artikel |
2 |
AlGaAs/GaAs and InGaAs/GaAs quantum wells grown on GaAs (111)A substrates
|
Watanabe, Toshihide |
|
1996 |
27 |
4-5 |
p. 411-421 11 p. |
artikel |
3 |
Epitaxy of Mn-based magnetic thin films on semiconductors
|
De Boeck, J. |
|
1996 |
27 |
4-5 |
p. 383-392 10 p. |
artikel |
4 |
Growth and characterization of HTSC thin films for microelectronic devices
|
Perrin, A. |
|
1996 |
27 |
4-5 |
p. 343-360 18 p. |
artikel |
5 |
Growth of GaAs epitaxial layers on porous silicon
|
Kang, T.W. |
|
1996 |
27 |
4-5 |
p. 423-436 14 p. |
artikel |
6 |
Low dimensional structures and devices: epitaxial deposition techniques and materials systems
|
Henini, M. |
|
1996 |
27 |
4-5 |
p. 253-255 3 p. |
artikel |
7 |
MBE growth of fluorides
|
Sugiyama, Muneshiro |
|
1996 |
27 |
4-5 |
p. 361-382 22 p. |
artikel |
8 |
MBE growth physics: application to device technology
|
Herman, Marian A. |
|
1996 |
27 |
4-5 |
p. 257-296 40 p. |
artikel |
9 |
MCP Wafer Technology profile
|
|
|
1996 |
27 |
4-5 |
p. xxi-xxv nvt p. |
artikel |
10 |
MOVPE growth of III–V compounds for optoelectronic and electronic applications
|
Behet, M. |
|
1996 |
27 |
4-5 |
p. 297-334 38 p. |
artikel |
11 |
News and updates in device application, process and materials, being applied in today's microelectronics industry
|
|
|
1996 |
27 |
4-5 |
p. xxvii-l nvt p. |
artikel |
12 |
Porous silicon: a route towards a Si-based photonics?
|
Pavesi, Lorenzo |
|
1996 |
27 |
4-5 |
p. 437-448 12 p. |
artikel |
13 |
R&D of compound semiconductor materials in Japan energy
|
Sato, S. |
|
1996 |
27 |
4-5 |
p. xv-xx nvt p. |
artikel |
14 |
Scaling of MOVPE processes between 1 × 2″ and 95 × 2″ wafers
|
Schmitz, Dietmar |
|
1996 |
27 |
4-5 |
p. 335-342 8 p. |
artikel |
15 |
Stoichiometric low temperature (SLT) GaAs and AlGaAs grown by molecular beam epitaxy
|
Missous, M. |
|
1996 |
27 |
4-5 |
p. 393-409 17 p. |
artikel |
16 |
VGF Excellence at AXT: a major force in manufacturing III-V semiconductor substrates
|
Liu, Xiao |
|
1996 |
27 |
4-5 |
p. iii-xiii nvt p. |
artikel |