nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
Active device prescreening for hybrids
|
|
|
1980 |
11 |
6 |
p. 38- 1 p. |
artikel |
2 |
Active simulations using current conveyors
|
Pal, K. |
|
1980 |
11 |
6 |
p. 27-28 2 p. |
artikel |
3 |
A high-stability RC circuit using high nitrogen doped tantalum
|
|
|
1980 |
11 |
6 |
p. 39- 1 p. |
artikel |
4 |
Air film system for handling semiconductor wafers
|
|
|
1980 |
11 |
6 |
p. 40- 1 p. |
artikel |
5 |
Analysis of microprocessors test generation — its meaning and use
|
|
|
1980 |
11 |
6 |
p. 41- 1 p. |
artikel |
6 |
An analysis of LPCVD system parameters for polysilicon, silicon nitride and silicon dioxide deposition
|
|
|
1980 |
11 |
6 |
p. 39- 1 p. |
artikel |
7 |
A new resistor system for high reliability applications
|
|
|
1980 |
11 |
6 |
p. 38- 1 p. |
artikel |
8 |
An overview of E-beam mask-making
|
|
|
1980 |
11 |
6 |
p. 40- 1 p. |
artikel |
9 |
A programmable pseudo-random noise generator
|
Greenshield, G. |
|
1980 |
11 |
6 |
p. 25-26 2 p. |
artikel |
10 |
A thick film capacitive temperature sensor using barium strontium titanate glass formulations
|
|
|
1980 |
11 |
6 |
p. 41- 1 p. |
artikel |
11 |
Characteristics of three-terminal metal-tunnel Oxide-n/p + devices
|
|
|
1980 |
11 |
6 |
p. 40- 1 p. |
artikel |
12 |
Classified index to articles — Vols. 10 & 11 inclusive
|
|
|
1980 |
11 |
6 |
p. 43-44 2 p. |
artikel |
13 |
C-MOS LSI: comparing second-generation approaches
|
|
|
1980 |
11 |
6 |
p. 41- 1 p. |
artikel |
14 |
Computer controlled optical microprojection system for one micron structures
|
|
|
1980 |
11 |
6 |
p. 40- 1 p. |
artikel |
15 |
Diffusion of boron into silicon from doped oxide source
|
Prasad, P.M. |
|
1980 |
11 |
6 |
p. 21-24 4 p. |
artikel |
16 |
Digital phase-locked loop finds clock signal in bit stream
|
|
|
1980 |
11 |
6 |
p. 36- 1 p. |
artikel |
17 |
Double epitaxy method for the simultaneous manufacture of I2L-arrangements and insulated transistors
|
|
|
1980 |
11 |
6 |
p. 40- 1 p. |
artikel |
18 |
Echo-cancelling chip opens way to increased use of satellite channels
|
|
|
1980 |
11 |
6 |
p. 37- 1 p. |
artikel |
19 |
ECL accelerates to new system speeds with high-density byte-slice parts
|
|
|
1980 |
11 |
6 |
p. 36- 1 p. |
artikel |
20 |
Editorial
|
Butcher, John |
|
1980 |
11 |
6 |
p. 3- 1 p. |
artikel |
21 |
Electron-exciton inelastic collision cross sections for different semiconductors
|
|
|
1980 |
11 |
6 |
p. 37- 1 p. |
artikel |
22 |
Electronic dielectric constant of III–V semiconductors
|
|
|
1980 |
11 |
6 |
p. 39- 1 p. |
artikel |
23 |
Electronics for the motor industry — What will be the impact?
|
Westbrook, M. |
|
1980 |
11 |
6 |
p. 31-35 5 p. |
artikel |
24 |
Electron trapping in neutron-irradiated very thin films of Al2O3
|
|
|
1980 |
11 |
6 |
p. 39- 1 p. |
artikel |
25 |
Energy levels and degeneracy ratios for magnesium in n-type silicon
|
|
|
1980 |
11 |
6 |
p. 38- 1 p. |
artikel |
26 |
E-Prom doubles bit density without adding a pin
|
|
|
1980 |
11 |
6 |
p. 37- 1 p. |
artikel |
27 |
Evaluation delay cut by low-cost microprocessor development
|
|
|
1980 |
11 |
6 |
p. 37- 1 p. |
artikel |
28 |
Generalised transport equations for semiconductors
|
|
|
1980 |
11 |
6 |
p. 41- 1 p. |
artikel |
29 |
Hermetic packages for hybrid circuits
|
|
|
1980 |
11 |
6 |
p. 37- 1 p. |
artikel |
30 |
HMOS II static RAMs overtake bipolar competition
|
|
|
1980 |
11 |
6 |
p. 36- 1 p. |
artikel |
31 |
Hybrid IC structures using solder reflow technology
|
|
|
1980 |
11 |
6 |
p. 37- 1 p. |
artikel |
32 |
Integrated bandsplit filter system for a dual-tone-multifrequency receiver
|
Gregorian, R. |
|
1980 |
11 |
6 |
p. 5-12 8 p. |
artikel |
33 |
Low expansivity organic substrate for flip-chip bonding
|
|
|
1980 |
11 |
6 |
p. 38- 1 p. |
artikel |
34 |
MNOS technology — will it survive?
|
|
|
1980 |
11 |
6 |
p. 36- 1 p. |
artikel |
35 |
Model for describing emission characteristics of electron-beam evaporation sources
|
|
|
1980 |
11 |
6 |
p. 41- 1 p. |
artikel |
36 |
Modular IC tester is easily optimised
|
|
|
1980 |
11 |
6 |
p. 41- 1 p. |
artikel |
37 |
Monolithic MICs gain momentum as gallium arsenide MSI nears
|
|
|
1980 |
11 |
6 |
p. 37- 1 p. |
artikel |
38 |
Multiprocessors architectures
|
|
|
1980 |
11 |
6 |
p. 41- 1 p. |
artikel |
39 |
Negative Hall effect of hot holes in silicon
|
|
|
1980 |
11 |
6 |
p. 39- 1 p. |
artikel |
40 |
New generation of electronic components and how they influence printed circuit boards
|
|
|
1980 |
11 |
6 |
p. 37-38 2 p. |
artikel |
41 |
Nonequilibrium response of m.o.s. devices to a linear voltage ramp in the presence of illumination
|
|
|
1980 |
11 |
6 |
p. 36- 1 p. |
artikel |
42 |
[No title]
|
Weatherley, R.T. |
|
1980 |
11 |
6 |
p. 42- 1 p. |
artikel |
43 |
[No title]
|
Weatherley, R.T. |
|
1980 |
11 |
6 |
p. 42- 1 p. |
artikel |
44 |
[No title]
|
Matthews, R.B. |
|
1980 |
11 |
6 |
p. 42- 1 p. |
artikel |
45 |
Now for the math-processing chips
|
|
|
1980 |
11 |
6 |
p. 41- 1 p. |
artikel |
46 |
Observation of a donor exciton band in silicon
|
|
|
1980 |
11 |
6 |
p. 41- 1 p. |
artikel |
47 |
Older processes revamped as new arrivals extend performance limits
|
|
|
1980 |
11 |
6 |
p. 41- 1 p. |
artikel |
48 |
One-chip data-encryption unit accesses memory directly
|
|
|
1980 |
11 |
6 |
p. 36- 1 p. |
artikel |
49 |
One micron range photoresist imaging; a practical approach
|
|
|
1980 |
11 |
6 |
p. 40- 1 p. |
artikel |
50 |
On the splitting of the exciton ground state in silicon
|
|
|
1980 |
11 |
6 |
p. 37- 1 p. |
artikel |
51 |
Peripheral chips shift microprocessor systems into high gear
|
|
|
1980 |
11 |
6 |
p. 37- 1 p. |
artikel |
52 |
pn Junction applications and transport properties in polysilicon rods
|
|
|
1980 |
11 |
6 |
p. 38-39 2 p. |
artikel |
53 |
Polysilicon production: cost analysis of conventional process
|
|
|
1980 |
11 |
6 |
p. 38- 1 p. |
artikel |
54 |
Pressure oxidation of silicon: an emerging technology
|
|
|
1980 |
11 |
6 |
p. 40- 1 p. |
artikel |
55 |
Processing considerations to achieve optimum performance from low TCR resistor systems
|
|
|
1980 |
11 |
6 |
p. 38- 1 p. |
artikel |
56 |
Redistribution of dopant impurities in oxidising ambients
|
|
|
1980 |
11 |
6 |
p. 37- 1 p. |
artikel |
57 |
Reed relays in microprocessor-based data-acquisition systems
|
Brown, Peter |
|
1980 |
11 |
6 |
p. 29-30 2 p. |
artikel |
58 |
Role of chlorine in silicon oxidation (Part 1)
|
|
|
1980 |
11 |
6 |
p. 39- 1 p. |
artikel |
59 |
Role of chlorine in silicon oxidation — Part II
|
|
|
1980 |
11 |
6 |
p. 40- 1 p. |
artikel |
60 |
Scaled process adds new life to bipolar RAMs
|
|
|
1980 |
11 |
6 |
p. 37- 1 p. |
artikel |
61 |
Silver migration and the reliability of Pd/Ag conductors in thick-film dielectric crossover structures
|
|
|
1980 |
11 |
6 |
p. 39- 1 p. |
artikel |
62 |
Simple S-parameter measurement of base spreading resistance
|
Unwin, R.T. |
|
1980 |
11 |
6 |
p. 18-20 3 p. |
artikel |
63 |
Store coupling of unequal microprocessors
|
|
|
1980 |
11 |
6 |
p. 41- 1 p. |
artikel |
64 |
Temperature dependence of the Hall coefficient of thin films
|
|
|
1980 |
11 |
6 |
p. 39- 1 p. |
artikel |
65 |
The determination of interfacial and bulk properties of gold and m.o.s. structures using quasiequilibrium and non-steady-state linear voltage-ramp techniques
|
|
|
1980 |
11 |
6 |
p. 38- 1 p. |
artikel |
66 |
Theoretical estimates of the sheet resistance of Gaussian n-type ion-implanted layers in semiconductors: phosphorus in silicon
|
|
|
1980 |
11 |
6 |
p. 41- 1 p. |
artikel |
67 |
The use of saddle-field ion sources for etching semiconductor materials
|
Goldspink, G.F. |
|
1980 |
11 |
6 |
p. 13-17 5 p. |
artikel |
68 |
Tunnels in semiconductor epitaxy
|
|
|
1980 |
11 |
6 |
p. 39- 1 p. |
artikel |
69 |
V-MOS chip joins microprocessor to handle signals in real time
|
|
|
1980 |
11 |
6 |
p. 41- 1 p. |
artikel |
70 |
Yield improvement on L.S.I.
|
|
|
1980 |
11 |
6 |
p. 40- 1 p. |
artikel |