nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
About the self-consistence condition in the electron-exchange theory of the secondary ion emission of metals
|
Veksler, VI |
|
1996 |
47 |
2 |
p. 177-178 2 p. |
artikel |
2 |
A molybdenum metallorganic complex: an XPS investigation to confirm its identity
|
Bianchi, CL |
|
1996 |
47 |
2 |
p. 179-182 4 p. |
artikel |
3 |
An ion source for solid elements with mechanical sputtering
|
Meldizon, Jerzy |
|
1996 |
47 |
2 |
p. 209-210 2 p. |
artikel |
4 |
Auger and energy loss spectroscopy analysis of silicon carbide (SiC) surfaces
|
Ghamnia, M |
|
1996 |
47 |
2 |
p. 141-143 3 p. |
artikel |
5 |
Balzers-Pfeiffer
|
|
|
1996 |
47 |
2 |
p. iii- 1 p. |
artikel |
6 |
Calculations of isosteric heats of adsorption of neon and hydrogen adsorbed on charcoal in the temperature range 22–90 K
|
Yanik, R |
|
1996 |
47 |
2 |
p. 205-207 3 p. |
artikel |
7 |
Ceramic to metal assemblies
|
|
|
1996 |
47 |
2 |
p. v- 1 p. |
artikel |
8 |
DC conduction through UHV deposited tellurium films
|
Swan, R |
|
1996 |
47 |
2 |
p. 129-131 3 p. |
artikel |
9 |
Deposition of highly supersaturated metastable aluminium-molybdenum alloys by closed field unbalanced magnetron sputtering
|
Bates, RI |
|
1996 |
47 |
2 |
p. 107-111 5 p. |
artikel |
10 |
Deposition of thin films using microwave plasmas: present status and trends
|
Musil, J |
|
1996 |
47 |
2 |
p. 145-155 11 p. |
artikel |
11 |
Edwards press information
|
|
|
1996 |
47 |
2 |
p. ii- 1 p. |
artikel |
12 |
Electron energy and angular distribution of electrons in a helium DC glow discharge cathode sheath with transverse magnetic fields
|
Wei, Helin |
|
1996 |
47 |
2 |
p. 167-172 6 p. |
artikel |
13 |
Hiden analytical Ltd
|
|
|
1996 |
47 |
2 |
p. ii- 1 p. |
artikel |
14 |
Hiden 3F/PIC series quadrupole mass spectrometers
|
|
|
1996 |
47 |
2 |
p. i- 1 p. |
artikel |
15 |
Investigation of Se molecular beams used for MBE
|
Minchev, GM |
|
1996 |
47 |
2 |
p. 157-165 9 p. |
artikel |
16 |
Kinetics of the growth of Al-oxidized films in a high-frequency oxygen plasma
|
Sun, Da-Ming |
|
1996 |
47 |
2 |
p. 113-117 5 p. |
artikel |
17 |
Kurt J Lesker
|
|
|
1996 |
47 |
2 |
p. i- 1 p. |
artikel |
18 |
Magnetic and magneto-optical properties of sputtered high Bi-substituted Al/BiGaDylG double layer thin films
|
Zhang, Huai-Wu |
|
1996 |
47 |
2 |
p. 201-204 4 p. |
artikel |
19 |
MKS expands Massachusetts manufacturing capabilities
|
|
|
1996 |
47 |
2 |
p. ii- 1 p. |
artikel |
20 |
New range of compact piezo gauges from Balzers-Pfeiffer UK
|
|
|
1996 |
47 |
2 |
p. iv- 1 p. |
artikel |
21 |
News from Morgan Matroc
|
|
|
1996 |
47 |
2 |
p. iii- 1 p. |
artikel |
22 |
Plasma polymerized hexamethyldisiloxane: discharge and film studies
|
Durrant, SF |
|
1996 |
47 |
2 |
p. 187-192 6 p. |
artikel |
23 |
P-polarized reflectance spectroscopy: A highly sensitive real-time monitoring technique to study surface kinetics under steady state epitaxial deposition conditions
|
Dietz, N |
|
1996 |
47 |
2 |
p. 133-140 8 p. |
artikel |
24 |
Reliability and performance ATP turbomolecular pumps
|
|
|
1996 |
47 |
2 |
p. iv- 1 p. |
artikel |
25 |
Rotational temperature measurements in hydrogen discharges
|
Laimer, J |
|
1996 |
47 |
2 |
p. 183-186 4 p. |
artikel |
26 |
Schott product update
|
|
|
1996 |
47 |
2 |
p. ii- 1 p. |
artikel |
27 |
Secondary ion emission from silicon under 8 keV O2 + and Ar+ ion bombardment
|
Huan, CHA |
|
1996 |
47 |
2 |
p. 119-127 9 p. |
artikel |
28 |
Surface phenomena and isotope effects in the process of titanium hydrides (deuterides) formation
|
Nowicka, E |
|
1996 |
47 |
2 |
p. 193-199 7 p. |
artikel |
29 |
Techware systems introduces the CONTROLPower 7800 advanced controls upgrade for applied materials 7800 series epi reactors
|
|
|
1996 |
47 |
2 |
p. iv- 1 p. |
artikel |
30 |
The deduction of continuously distributed activation energy populations from the moments of thermal evolution spectra
|
Carter, G |
|
1996 |
47 |
2 |
p. 103-106 4 p. |
artikel |
31 |
The deduction of initial concentration profiles from sputter depth sectioning measurements
|
Carter, G |
|
1996 |
47 |
2 |
p. 97-102 6 p. |
artikel |
32 |
The effects of a quadrupole mass analyser on measurement of UHV residual gas composition
|
Jirsàk, Tomàš |
|
1996 |
47 |
2 |
p. 173-176 4 p. |
artikel |
33 |
Tosoh SMD offers cost fo ownership for sputtering targets on the market today
|
|
|
1996 |
47 |
2 |
p. v- 1 p. |
artikel |
34 |
Vacuum diary
|
|
|
1996 |
47 |
2 |
p. vii-viii nvt p. |
artikel |
35 |
Vacuum product news
|
|
|
1996 |
47 |
2 |
p. i- 1 p. |
artikel |
36 |
X-TRONIX scientific and industrial technologies
|
|
|
1996 |
47 |
2 |
p. vi- 1 p. |
artikel |