nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
Adsorption-desorption kinetics of NO on a Pd surface with thermal desorption spectroscopy and molecular beam relaxation spectrometry
|
Xi, Guangkang |
|
1993 |
44 |
2 |
p. 79-82 4 p. |
artikel |
2 |
An analysis of the structure of the 13X molecular sieve in ion exchange
|
Da-Ming, Sun |
|
1993 |
44 |
2 |
p. 75-78 4 p. |
artikel |
3 |
Announcement
|
|
|
1993 |
44 |
2 |
p. 163- 1 p. |
artikel |
4 |
A precision gas flowmeter for vacuum metrology
|
Jousten, K |
|
1993 |
44 |
2 |
p. 135-141 7 p. |
artikel |
5 |
A study of HCD ion plated titanium nitride films
|
Ai, CF |
|
1993 |
44 |
2 |
p. 99-104 6 p. |
artikel |
6 |
Conferences on related topics
|
|
|
1993 |
44 |
2 |
p. 159-160 2 p. |
artikel |
7 |
Development of a QMS with a ceramic single-piece quadrupole
|
Hiroki, Seiji |
|
1993 |
44 |
2 |
p. 71-74 4 p. |
artikel |
8 |
Direct current diode sputtering: a study of the thermal power dissipated in the substrate
|
Mahéo, D |
|
1993 |
44 |
2 |
p. 117-121 5 p. |
artikel |
9 |
Editorial: Software Survey Section
|
|
|
1993 |
44 |
2 |
p. i-iv nvt p. |
artikel |
10 |
Electrical resistivity of crystalline Sb2Se3
|
Abd El-Salam, F |
|
1993 |
44 |
2 |
p. 111-116 6 p. |
artikel |
11 |
Electron microscopy of structurally different titanium disilicide films, obtained in one technological process
|
Kiselev, NA |
|
1993 |
44 |
2 |
p. 143-150 8 p. |
artikel |
12 |
Estimation of the coating/substrate interface temperature during deposition by impulse plasma excitation
|
Zdunek, Krzystof |
|
1993 |
44 |
2 |
p. 93-97 5 p. |
artikel |
13 |
Fusion division of IUVSTA. Report presented to the Triennial Scientific Highlights Seminar (September 1991)
|
Coad, JP |
|
1993 |
44 |
2 |
p. 155-157 3 p. |
artikel |
14 |
Matching of TiN coating structures by plasma nitriding of substrates
|
Zlatanovi'c, M |
|
1993 |
44 |
2 |
p. 83-88 6 p. |
artikel |
15 |
Optical properties of ZnO thin films deposited by dc reactive magnetron sputtering
|
Meng, Li-jian |
|
1993 |
44 |
2 |
p. 105-109 5 p. |
artikel |
16 |
Structure of a-Si: H/a-Si1−x C x: H multilayers deposited in a reactor with automated substrate holder
|
Bertomeu, J |
|
1993 |
44 |
2 |
p. 129-134 6 p. |
artikel |
17 |
Test of a model solar bakeout system for laser interferometer gravitational wave detectors
|
Berinson, D |
|
1993 |
44 |
2 |
p. 151-154 4 p. |
artikel |
18 |
The effect of scaling on contact and interconnect properties with sputtered TiSi2 metallization
|
Nahar, RK |
|
1993 |
44 |
2 |
p. 89-92 4 p. |
artikel |
19 |
Use of a CCl2F2/H2 plasma for the reactive ion etching of GaAs
|
Horniaková, A |
|
1993 |
44 |
2 |
p. 123-127 5 p. |
artikel |
20 |
Vacuum technology and applications
|
Steckelmacher, W |
|
1993 |
44 |
2 |
p. 161- 1 p. |
artikel |