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Details for article 20 of 37 found articles
| Title: |
Preparation of Substituted N-Methacryloxy Phthalimides for E-Beam Lithography |
| Author: |
Guntupalli, Maheedhar Wilkins, Cletus W. Cassidy, Patrick E. |
| Appeared in: |
International journal of polymeric materials |
| Paging: | Volume 57 (2008) nr. 5 pages 442-451 |
| Year: |
2008-05 |
| Contents: |
Poly (methyl methacrylate) (PMMA) is a very good option for electron-beam resists, but suffers from poor radiation sensitivity and poor plasma etch resistance. These problems can be offset, at least in part, by functionalizing the PMMA with photo-labile, plasma etch-resistance groups. Toward this end, a series of N-methacryloxy phthalimides with different substitutuents (methyl, nitro, tetrahydrogen and dichloro) were synthesized as possible useful radiation-sensitive resists. The work discussed here focuses on the cycloimido group, which can be easily attached to methacrylic acid to form a radiation-sensitive resist material for use in electron beam lithography. The labile N-O bond of the cycloimido group, upon exposure to radiation, cleaves and forms a radical on the main chain of the polymer, which leads to polymer degradation. Cursory evaluations showed that these new materials are deserving of further study. |
| Publisher: |
Taylor & Francis |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 20 of 37 found articles
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