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Details for article 115 of 127 found articles
| Title: |
The preparation and properties of PZT thin film by sputering method |
| Author: |
Chen, Huiting Yu, Dawei Dong, Xianling Duan, Ning Wang, Yongling |
| Appeared in: |
Ferroelectrics letters section |
| Paging: | Volume 20 (1995) nr. 1-2 pages 35-40 |
| Year: |
1995-11-01 |
| Contents: |
The ferroelectric PZT thin films were prepared on Pt/Ti/SiO2/Si substrate by RF sputtering method followed by the rapid thermal annealing. The preparation of the Pt and Ti thin films as bottom electrode, and their influences on the PZT thin films were studied in details. The substrate temperature during sputtering was room temperature; the rapid thermal annealing temperature was 500°C-750°C and the annealing time was 30-70s. The influences of different preparation parameters on the structure and electric properties were studied with X-ray diffraction technique and RT66A Standardized Ferroelectric Test System. The electric properties of the prepared PZT thin film was: Pa=39μc/cm2, Pr = 9.3 μc/cm2, Ec=28KV/mm, ε=300, p=109ω⋅cm. |
| Publisher: |
Taylor & Francis |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 115 of 127 found articles
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