|
| << vorige | volgende >> |
Tijdschrift beschrijving
Alle jaargangen van het bijbehorende tijdschrift
Alle afleveringen van het bijbehorende jaargang
Alle artikelen van de bijbehorende aflevering
Details van artikel 236 van 262 gevonden artikelen
| Titel: |
TEE EFFECIS OF EXTENDED THIN FILM EVAPORATION AND EXPWNAL DIFFUSION RESISTANCE DURING THE CONSTANT DRYING RATE PERIOD |
| Auteur: |
Lee, Maw Tien Maa, Jer Ru |
| Verschenen in: |
Drying technology |
| Paginering: | Jaargang 10 (1992) nr. 2 pagina's 395-419 |
| Jaar: |
1992-03-01 |
| Inhoud: |
Extended thin film evaporation with external diffusion resistance is analyzed for the constant rate period of the drying process, in which a polar liquid evaporates from porous bodies made of glass. The extended thin film is defined as the Liquid film in which the disjoining pressure dominates the fluid flar field and works as the driving force replenishing the evaporating Liquid. The results of the analysis shows that due to the existence of the evaporating thin Liquid film, the evaporation fran the extended thin film can compensate the reduction of evaporation rate caused by the increase of the dry spots and keep the drying rate the same as or even greater than that of the completely wetted surface. The external diffusion resistance makes the vapor concentration near the porous solid surface remain constant and therefore keeps |
| Uitgever: |
Taylor & Francis |
| Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
Details van artikel 236 van 262 gevonden artikelen
| << vorige | volgende >> |