Adhesion of PMDA-ODA polyimide to silicon oxide surface: sensitivity to fluorine contamination
Titel:
Adhesion of PMDA-ODA polyimide to silicon oxide surface: sensitivity to fluorine contamination
Auteur:
Buchwalter, L.P.IBM East Fishkill Facility, Rt 52, Hopewell Jct, NY 12533, USA Lacombe, R.H.IBM East Fishkill Facility, Rt 52, Hopewell Jct, NY 12533, USA