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                                       Details for article 13 of 21 found articles
 
 
  Physical model for the evolution of the defect system of silicon carbide with allowance for the internal elastic stress fields during implantation of Al+ and N+ and subsequent annealing
 
 
Title: Physical model for the evolution of the defect system of silicon carbide with allowance for the internal elastic stress fields during implantation of Al+ and N+ and subsequent annealing
Author: Kulikov, D. V.
Trushin, Yu. V.
Rybin, P. V.
Kharlamov, V. S.
Appeared in: Technical physics
Paging: Volume 44 (1999) nr. 10 pages 1168-1174
Year: 1999
Contents:
Publisher: Nauka/Interperiodica, Moscow
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 13 of 21 found articles
 
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