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Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 8 of 27 found articles
| Title: |
Effects of aperture size and pressure on XeF2 etching of silicon |
| Author: |
Su, K. Tabata, O. |
| Appeared in: |
Microsystem technologies |
| Paging: | Volume 9 (2002) nr. 1-2 pages 11-16 |
| Year: |
2002 |
| Contents: | |
| Publisher: |
Springer-Verlag, Berlin Heidelberg |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 8 of 27 found articles
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