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Journal description
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Details for article 29 of 54 found articles
| Title: |
Low-temperature Surface Passivation of Moderately Doped Crystalline Silicon by Atomic-layer-deposited Hafnium Oxide Films |
| Author: |
Lin, F. Hoex, B. Koh, Y.H. Lin, J.J. Aberle, A.G. |
| Appeared in: |
Energy procedia |
| Paging: | Volume 15 (2012) nr. C pages 7 p. |
| Year: |
2012 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 29 of 54 found articles
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