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Journal description
All volumes of the corresponding journal
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Details for article 60 of 60 found articles
| Title: |
WSi x /WN/polysilicon DRAM gate stack with a 50Å WN layer as a diffusion barrier and an etch stop |
| Author: |
Lee, Heon Kim, Dong-Hwan Huh, Joo-Youl Kim, Deok-kee |
| Appeared in: |
Materials science in semiconductor processing |
| Paging: | Volume 8 (2005) nr. 5 pages 6 p. |
| Year: |
2005 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 60 of 60 found articles
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