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  Modeling the effect of thin gate insulators (SiO2, SiN, Al2O3 and HfO2) on AlGaN/GaN HEMT forward characteristics grown on Si, sapphire and SiC
 
 
Title: Modeling the effect of thin gate insulators (SiO2, SiN, Al2O3 and HfO2) on AlGaN/GaN HEMT forward characteristics grown on Si, sapphire and SiC
Author: Pérez-Tomás, A.
Fontserè, A.
Jennings, M.R.
Gammon, P.M.
Appeared in: Materials science in semiconductor processing
Paging: Volume 16 (2013) nr. 5 pages 10 p.
Year: 2013
Contents:
Publisher: Elsevier Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

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