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Journal description
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Details for article 8 of 38 found articles
| Title: |
Atomic-level stress calculation and surface roughness of film deposition process using molecular dynamics simulation |
| Author: |
Hong, Zheng-Han Hwang, Shun-Fa Fang, Te-Hua |
| Appeared in: |
Computational materials science |
| Paging: | Volume 48 (2010) nr. 3 pages 9 p. |
| Year: |
2010 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 8 of 38 found articles
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