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Journal description
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Details for article 16 of 28 found articles
| Title: |
Modeling of the long-range interstitial migration of ion implanted boron |
| Author: |
Velichko, O.I. Kniazhava, N.V. |
| Appeared in: |
Computational materials science |
| Paging: | Volume 48 (2010) nr. 2 pages 4 p. |
| Year: |
2010 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 16 of 28 found articles
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