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Journal description
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Details for article 15 of 115 found articles
| Title: |
Atomistic modeling of dopant implantation and annealing in Si: damage evolution, dopant diffusion and activation |
| Author: |
Pelaz, Lourdes Marqués, Luis A. Aboy, Maria López, Pedro Barbolla, Juan |
| Appeared in: |
Computational materials science |
| Paging: | Volume 33 (2005) nr. 1-3 pages 14 p. |
| Year: |
2005 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 15 of 115 found articles
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