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                                       Details for article 11 of 23 found articles
 
 
  High-pressure condition of SiH4+Ar+H2 plasma for deposition of hydrogenated nanocrystalline silicon film
 
 
Title: High-pressure condition of SiH4+Ar+H2 plasma for deposition of hydrogenated nanocrystalline silicon film
Author: Parashar, A.
Kumar, Sushil
Dixit, P.N.
Gope, Jhuma
Rauthan, C.M.S.
Hashmi, S.A.
Appeared in: Solar energy materials and solar cells
Paging: Volume 92 (2008) nr. 10 pages 6 p.
Year: 2008
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 11 of 23 found articles
 
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