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Journal description
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Details for article 24 of 82 found articles
| Title: |
Effect of halogen additives on the stability of a-Si:H films deposited at a high-growth rate |
| Author: |
Nishimoto, Tomonori Takagi, Tomoko Kondo, Michio Matsuda, Akihisa |
| Appeared in: |
Solar energy materials and solar cells |
| Paging: | Volume 66 (2001) nr. 1-4 pages 7 p. |
| Year: |
2001 |
| Contents: | |
| Publisher: |
Elsevier Science B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 24 of 82 found articles
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