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                                       Details for article 5 of 192 found articles
 
 
  Analysis of the influence of the gas pressure during the deposition of electrochromic WO3 films by reactive r.f. sputtering of W and WO3 target
 
 
Title: Analysis of the influence of the gas pressure during the deposition of electrochromic WO3 films by reactive r.f. sputtering of W and WO3 target
Author: Masetti, E.
Grilli, M.L.
Dautzenberg, G.
Macrelli, G.
Adamik, M.
Appeared in: Solar energy materials and solar cells
Paging: Volume 56 (1999) nr. 3-4 pages 11 p.
Year: 1999
Contents:
Publisher: Elsevier Science B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 5 of 192 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands