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                                       Details for article 64 of 160 found articles
 
 
  High deposition rate device quality a-Si:H films at low substrate temperature by HWCVD technique
 
 
Title: High deposition rate device quality a-Si:H films at low substrate temperature by HWCVD technique
Author: Soni, S.K.
Phatak, Anup
Dusane, R.O.
Appeared in: Solar energy materials and solar cells
Paging: Volume 94 (2010) nr. 9 pages 4 p.
Year: 2010
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 64 of 160 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands