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                                       Details for article 25 of 29 found articles
 
 
  Total reflection x-ray fluorescence as a sensitive analysis method for the investigation of sputtering processes
 
 
Title: Total reflection x-ray fluorescence as a sensitive analysis method for the investigation of sputtering processes
Author: Sekowski, M.
Steen, C.
Nutsch, A.
Birnbaum, E.
Burenkov, A.
Pichler, P.
Appeared in: Spectrochimica acta. Part B, Atomic spectroscopy
Paging: Volume 63 (2008) nr. 12 pages 5 p.
Year: 2008
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 25 of 29 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands