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Characterization of film materials in wafer processing technology development by XPS |
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Titel: |
Characterization of film materials in wafer processing technology development by XPS |
Auteur: |
Saheli, Ghazal Liu, Wei Lazik, Christopher Uritsky, Yuri Bevan, Malcolm Tang, Wei Ma, Paul Venkatasubramanian, Eswaranand Bobek, Sarah Kulshreshtha, Prashant Brundle, C.R. |
Verschenen in: |
Journal of electron spectroscopy and related phenomena |
Paginering: |
Jaargang 231 (2019) nr. C pagina's 57-67 |
Jaar: |
2019 |
Inhoud: |
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Uitgever: |
Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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