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Journal description
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Details for article 213 of 377 found articles
| Title: |
Near edge X-ray absorption fine structure spectroscopy of chemically modified porous silicon |
| Author: |
Hu, Y.F. Boukherroub, R. Sham, T.K. |
| Appeared in: |
Journal of electron spectroscopy and related phenomena |
| Paging: | Volume 135 (2004) nr. 2-3 pages 5 p. |
| Year: |
2004 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 213 of 377 found articles
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