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Journal description
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Details for article 51 of 60 found articles
| Title: |
Surface reaction mechanism of Y2O3 atomic layer deposition on the hydroxylated Si(100)-2×1: A density functional theory study |
| Author: |
Ren, Jie Zhou, Guangfen Hu, Yongqi Zhang, David Wei |
| Appeared in: |
Applied surface science |
| Paging: | Volume 255 (2009) nr. 16 pages 6 p. |
| Year: |
2009 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 51 of 60 found articles
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