|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 15 of 60 found articles
| Title: |
Effect of modification of S-terminated Ge(100) surface on ALD HfO2 gate stack |
| Author: |
Lee, Younghwan Park, Kibyung Im, Kyung Taek Lee, June Young Im, Seongil Lee, Jung Han Yi, Yeonjin Lim, Sangwoo |
| Appeared in: |
Applied surface science |
| Paging: | Volume 255 (2009) nr. 16 pages 4 p. |
| Year: |
2009 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 15 of 60 found articles
| << previous | next >> |