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                                       Details for article 43 of 68 found articles
 
 
  Microstructure and stress in high-k Hf–Y–O thin films
 
 
Title: Microstructure and stress in high-k Hf–Y–O thin films
Author: Gluch, J.
Rößler, T.
Menzel, S.B.
Eckert, J.
Appeared in: Microelectronic engineering
Paging: Volume 88 (2011) nr. 5 pages 3 p.
Year: 2011
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 43 of 68 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands