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                                       Details for article 12 of 68 found articles
 
 
  Comparison of radio frequency physical vapor deposition target material used for LaO x cap layer deposition in 32nm NMOSFETs
 
 
Title: Comparison of radio frequency physical vapor deposition target material used for LaO x cap layer deposition in 32nm NMOSFETs
Author: Baudot, S.
Caubet, P.
Grégoire, M.
Bianchi, R.A.
Pantel, R.
Zoll, S.
Gros-Jean, M.
Boujamaa, R.
Normandon, P.
Leroux, C.
Ghibaudo, G.
Appeared in: Microelectronic engineering
Paging: Volume 88 (2011) nr. 5 pages 4 p.
Year: 2011
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 12 of 68 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands