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                                       Details for article 11 of 24 found articles
 
 
  Fabrication and characterization of Zr-rich Zr-aluminate films for high-κ gate dielectric applications
 
 
Title: Fabrication and characterization of Zr-rich Zr-aluminate films for high-κ gate dielectric applications
Author: Li, Yuanpeng
Zhu, Jun
Liu, Hongwei
Liu, Zhiguo
Appeared in: Microelectronic engineering
Paging: Volume 83 (2006) nr. 10 pages 7 p.
Year: 2006
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 11 of 24 found articles
 
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