|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 49 of 57 found articles
| Title: |
Stability of conducting amorphous Ru–Si–O thin films under oxygen annealing |
| Author: |
Cherry, H.B Giauque, P.H Nicolet, M.-A |
| Appeared in: |
Microelectronic engineering |
| Paging: | Volume 55 (2001) nr. 1-4 pages 6 p. |
| Year: |
2001 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 49 of 57 found articles
| << previous | next >> |