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                                       Details for article 74 of 130 found articles
 
 
  Investigation of photoresist-specific linearity in optical lithography
 
 
Title: Investigation of photoresist-specific linearity in optical lithography
Author: Martin, Brian
Arthur, Graham
Appeared in: Microelectronic engineering
Paging: Volume 35 (1997) nr. 1-4 pages 189-192
Year: 1997
Contents:
Publisher: Published by Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 74 of 130 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands