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Journal description
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Details for article 21 of 130 found articles
| Title: |
Bottom Anti-Reflective Coatings for DUV lithography: Determination of optimum thermal process conditions |
| Author: |
Schiltz, A. Terpan, J-F. Amblard, G. Paniez, P.J. |
| Appeared in: |
Microelectronic engineering |
| Paging: | Volume 35 (1997) nr. 1-4 pages 221-224 |
| Year: |
1997 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 21 of 130 found articles
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