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Journal description
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Details for article 102 of 130 found articles
| Title: |
Process latitude enhancement for 3D structure formation in e-beam lithography |
| Author: |
Kudryashov, V.A. Krasnov, V.V. Prewett, P.D. Hall, T.J. |
| Appeared in: |
Microelectronic engineering |
| Paging: | Volume 35 (1997) nr. 1-4 pages 487-490 |
| Year: |
1997 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 102 of 130 found articles
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