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                                       Details for article 24 of 26 found articles
 
 
  The electron-beam and x-ray lithographic performance of the high resolution CAMP and ARCH family of chemically amplified resists
 
 
Title: The electron-beam and x-ray lithographic performance of the high resolution CAMP and ARCH family of chemically amplified resists
Author: Novembre, Anthony E.
Münzel, Norbert
Appeared in: Microelectronic engineering
Paging: Volume 32 (1996) nr. 1-4 pages 11 p.
Year: 1996
Contents:
Publisher: Elsevier Science B.V. All rights reserved
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 24 of 26 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands