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Journal description
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Details for article 88 of 121 found articles
| Title: |
Reactive ion etching of multilayer mirrors for X-ray projection lithography masks |
| Author: |
Malek, C.Khan Ladan, F.R. Carré, M. Rivoira, R. |
| Appeared in: |
Microelectronic engineering |
| Paging: | Volume 13 (1991) nr. 1-4 pages 4 p. |
| Year: |
1991 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 88 of 121 found articles
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