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Journal description
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Details for article 60 of 183 found articles
| Title: |
Epoxide functionalized molecular resists for high resolution electron-beam lithography |
| Author: |
Lawson, Richard A. Lee, Cheng-Tsung Yueh, Wang Tolbert, Laren Henderson, Clifford L. |
| Appeared in: |
Microelectronic engineering |
| Paging: | Volume 85 (2008) nr. 5-6 pages 4 p. |
| Year: |
2008 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 60 of 183 found articles
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