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Journal description
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Details for article 26 of 183 found articles
| Title: |
Comparison of different methods for simulating the effect of specular ion reflection on microtrenching during dry etching of polysilicon |
| Author: |
Kunder, D. Bär, E. |
| Appeared in: |
Microelectronic engineering |
| Paging: | Volume 85 (2008) nr. 5-6 pages 4 p. |
| Year: |
2008 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 26 of 183 found articles
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