|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 103 of 183 found articles
| Title: |
Integration of EBDW of one entire metal layer as substitution for optical lithography in 220nm node microcontrollers |
| Author: |
Kretz, J. Roeper, H. Arndt, C. Bischoff, T. Choi, K.-H. Goldbeck, G. Gunia, M. Hohle, C. Lutz, T. Schubert, U. Schwerdtfeger, I. Thrum, F. Vennekamp, M. |
| Appeared in: |
Microelectronic engineering |
| Paging: | Volume 85 (2008) nr. 5-6 pages 4 p. |
| Year: |
2008 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 103 of 183 found articles
| << previous | next >> |