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Journal description
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Details for article 28 of 138 found articles
| Title: |
Controlling resist thickness and etch depth for fabrication of 3D structures in electron-beam grayscale lithography |
| Author: |
Kim, J. Joy, D.C. Lee, S.-Y. |
| Appeared in: |
Microelectronic engineering |
| Paging: | Volume 84 (2007) nr. 12 pages 6 p. |
| Year: |
2007 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 28 of 138 found articles
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