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Journal description
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Details for article 94 of 187 found articles
| Title: |
Improvement of thermal stability of Ni silicide on N+–Si by direct deposition of group III element (Al, B) thin film at Ni/Si interface |
| Author: |
Tsutsui, Kazuo Shiozawa, Takashi Nagahiro, Koji Ohishi, Yoshihisa Kakushima, Kuniyuki Ahmet, Parhat Urushihara, Nobuyuki Suzuki, Mineharu Iwai, Hiroshi |
| Appeared in: |
Microelectronic engineering |
| Paging: | Volume 85 (2008) nr. 10 pages 5 p. |
| Year: |
2008 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 94 of 187 found articles
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