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Journal description
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Details for article 122 of 187 found articles
| Title: |
Nanomechanical analyses of porous SiO2 low-dielectric-constant films for evaluation of interconnect structure reliability |
| Author: |
Chang, Shou-Yi Huang, Yi-Chung |
| Appeared in: |
Microelectronic engineering |
| Paging: | Volume 83 (2006) nr. 10 pages 10 p. |
| Year: |
2006 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 122 of 187 found articles
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