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                                       Details for article 7 of 36 found articles
 
 
  Characteristic features of an apparatus for plasma immersion ion implantation and physical vapour deposition
 
 
Title: Characteristic features of an apparatus for plasma immersion ion implantation and physical vapour deposition
Author: Ensinger, W.
Klein, J.
Usedom, P.
Rauschenbach, B.
Appeared in: Surface & coatings technology
Paging: Volume 93 (1997) nr. 2-3 pages 6 p.
Year: 1997
Contents:
Publisher: Elsevier Science S.A. All rights reserved.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 7 of 36 found articles
 
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