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Journal description
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Details for article 8 of 38 found articles
| Title: |
Effect of in situ H2-plasma cleaning on TiSi2 film properties in plasma enhanced chemical vapor deposition |
| Author: |
Fouad, Osama A. Yamazato, Masaaki Ahagon, Hiroshi Nagano, Masamitsu |
| Appeared in: |
Materials letters |
| Paging: | Volume 57 (2003) nr. 19 pages 5 p. |
| Year: |
2003 |
| Contents: | |
| Publisher: |
Elsevier Science B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 8 of 38 found articles
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