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                                       Details for article 38 of 47 found articles
 
 
  SiO2 film growth at room temperature by plasma enhanced evaporation in an UHV chamber
 
 
Title: SiO2 film growth at room temperature by plasma enhanced evaporation in an UHV chamber
Author: Strass, A
Hansch, W
Neubecker, A
Bieringer, P
Fischer, A
Eisele, I
Appeared in: Vacuum
Paging: Volume 48 (1997) nr. 7-9 pages 4 p.
Year: 1997
Contents:
Publisher: Published by Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 38 of 47 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands