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                                       Details for article 14 of 37 found articles
 
 
  Influence of a low field with opposite polarity to the stress on the degradation of 4.5 nm thick SiO2 films
 
 
Title: Influence of a low field with opposite polarity to the stress on the degradation of 4.5 nm thick SiO2 films
Author: Rodrı́guez, R.
Porti, M.
Nafrı́a, M.
Aymerich, X.
Appeared in: Microelectronics reliability
Paging: Volume 41 (2001) nr. 7 pages 3 p.
Year: 2001
Contents:
Publisher: Elsevier Science Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 14 of 37 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands