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Journal description
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Details for article 12 of 37 found articles
| Title: |
Impact of substituting SiO2 ILD by low k materials into AlCu RIE metallization |
| Author: |
Weber, D Höhnsdorf, F Hausmann, A Klipp, A Stavreva, Z Herrmann, J Bauch, L Neef, M.Junack, H Nichterwitz, M Finsterbusch, S Liebmann, R Kallis, N Kieslich, A |
| Appeared in: |
Microelectronics reliability |
| Paging: | Volume 41 (2001) nr. 7 pages 3 p. |
| Year: |
2001 |
| Contents: | |
| Publisher: |
Elsevier Science Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 12 of 37 found articles
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