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Journal description
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Details for article 60 of 85 found articles
| Title: |
Near-field-optical-probe induced resistance-change-detection (NF-OBIRCH) method for identifying defects in Al and TiSi interconnects |
| Author: |
Nikawa, K. Saiki, T. Inoue, S. Ohtsu, M. |
| Appeared in: |
Microelectronics reliability |
| Paging: | Volume 38 (1998) nr. 6-8 pages 6 p. |
| Year: |
1998 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 60 of 85 found articles
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