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Characterization of the silicon nitride–thermal oxide interface in oxide–nitride–oxide structures by ELS, XPS, ellipsometry, and numerical simulation |
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Titel: |
Characterization of the silicon nitride–thermal oxide interface in oxide–nitride–oxide structures by ELS, XPS, ellipsometry, and numerical simulation |
Auteur: |
Gritsenko, V.A. Svitasheva, S.N. Petrenko, I.P. Novikov, Yu.N. Morokov, Yu.N. Wong, Hei Kwok, R.W.M. Chan, R.W.M. |
Verschenen in: |
Microelectronics reliability |
Paginering: |
Jaargang 38 (1998) nr. 5 pagina's 7 p. |
Jaar: |
1998 |
Inhoud: |
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Uitgever: |
Elsevier Science Ltd |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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