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Journal description
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Details for article 89 of 103 found articles
| Title: |
Study of copper drift during TDDB of intermetal dielectrics by using fully passivated MOS capacitors as test vehicle |
| Author: |
Croes, K. Cannatá, G. Zhao, L. Tőkei, Zs. |
| Appeared in: |
Microelectronics reliability |
| Paging: | Volume 48 (2008) nr. 8-9 pages 4 p. |
| Year: |
2008 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 89 of 103 found articles
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