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                                       Details for article 31 of 31 found articles
 
 
  Two-step annealing effects on ultrathin EOT higher-k (k =40) ALD-HfO2 gate stacks
 
 
Title: Two-step annealing effects on ultrathin EOT higher-k (k =40) ALD-HfO2 gate stacks
Author: Morita, Yukinori
Migita, Shinji
Mizubayashi, Wataru
Masahara, Meishoku
Ota, Hiroyuki
Appeared in: Solid-state electronics
Paging: Volume 84 (2013) nr. C pages 7 p.
Year: 2013
Contents:
Publisher: Elsevier Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 31 of 31 found articles
 
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