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Journal description
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Details for article 20 of 24 found articles
| Title: |
Study of drain-extended NMOS under electrostatic discharge stress in 28nm and 40nm CMOS process |
| Author: |
Wang, Weihuai Jin, Hao Dong, Shurong Zhong, Lei Han, Yan |
| Appeared in: |
Solid-state electronics |
| Paging: | Volume 116 (2016) nr. C pages 8 p. |
| Year: |
2016 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 20 of 24 found articles
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